The Laboratory is equipped a high-power KrF Excimer Laser (Lambda Physik LPX220i).
The nanosecond pulse-duration and the repetition rate which can be tuned between
1 and 100 Hz, allows to use it in experiments of Pulsed Laser Deposition and Laser Ablation.
The experiments of Pulsed Laser Deposition use a home-made UHV deposition chamber integrating high precision substrate ovens.
Note: excimer lasers take their name from the excited state dimers from which lasing occurs. The most important excimers are rare gas halides such as Argon Fluoride (ArF), Krypton Fluoride (KrF), Xenon Chloride (XeCl) and Xenon Fluoride (XeF). These produce intense UV light (Ultra Violet) on distinct spectral lines between 193 nm and 351 nm. We actually use KrF – 248 nm emission.